Infrared lamp heating system
RTP-mini

This system is a compact desktop type of RTP-6 for conventional infrared-heating system.
We have achieved quiet heating with efficient cooling and reduced noise with eliminating the conventional heat exhaust unit and adopting a cooling fan.

Features

High-speed heating of small chips and thin wafers up to 2, 4, and 6 inches
Simple operation of Temperature Recipe with Original Program Software
Achieved a significant reduction in noise with a cooling fan
Cooling water flow checker installed for safety measures
Mounted a mass flow controller for process gas (N₂ gas)
Enhancement of control systems such as PLC, temperature controllers, touch panels, and over-temperature etc

Specifications

Temperature range	RT～1000℃ max.1100℃
Sample size	Standard φ6-inch wafer 1pcs (Please contact us for other wafer shapes)
Atmosphere	In N₂ gas flow/in vacuum (vacuum exhaust system is option)
Heating method	Upper single-side heating system using parabolic reflection infrared lamp
Maximum heating rate	10°C/s (using a SiC coated carbon susceptor)
Temperature uniformity	ΔT = 10℃ 2 minutes after holing at 800℃, during N₂ gas-flow (using a SiC coated carbon susceptor)
Control sensor	Thermocouple JIS-K

Utilities

System dimensions	Approx. W600 × D660 × H780 (mm)
Weight	Approx. 100 kg
Required power supply	Three-phase AC200V, 100A
Required cooling water	16L/min or more, 0.3MPa or more, 0.4MPa or less (Pressure varies depending on the installation environment)
Cooling water scramble	φ19×φ26 Cantouch fitting for tetron blade hose handed over
Vacuuming port	KF-16

System diagram

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Infrared lamp heating system RTP-mini