ADVANCE RIKO will try a new field with its various thermal technologies like Infrared Gold Image Furnace and Seebeck Coefficient/Electric Resistance Measurement System(ZEM).

Heating evaluation testing

Thermal treatments with high-speed heating and high-speed cooling can be performed using infrared lamps. Compared to resistance furnaces, temperatures rise quickly, and the amount of treated wafers can be drastically increased.

6-inch wafer annealing

A heater for wafers up to six inches. It is capable of rapid heating and cooling in a variable atmosphere in processes for Si semiconductors, compound semiconductors, and glass substrates.

Thermal treatments Temperature range Atmosphere Sample shape and Size
RT to 1000 °C Air
Inert gas
(Vacuum)
Max. 6-inch wafer

Introduction of available product

Heating test under various atmosphere

It can perform rapid/slow thermal treatments such as the annealing of various materials and gas quenching in a variable atmosphere.

Variable atmosphere
Thermal treatments
Temperature range Atmosphere Sample shape and Size
RT to 1100 °C Air
Inert gas
(Vacuum)
50 mm length x 100 mm
x 1 mm to 10 mm
thickness
* Requires consultation

Introduction of available product

Heatng test for small sample

Capable of clean and rapid heating and cooling of comparatively small samples in a variable atmosphere.

Thermal treatments Temperature range Atmosphere Sample shape and Size
RT to 1200 °C Air
Inert gas
(Vacuum)
Max. 20 mm square x 2 mm
thickness

Introduction of available product

Heatng test for small sample

Capable of ultra-high temperature heating of small samples up to 1800°C.

Thermal treatments Temperature range Atmosphere Sample shape and Size
RT to 1800 °C Air
Inert gas
Vacuum
Max. φ 6 mm x 6 mm

Introduction of available product

Please feel Free to contact us.

ADVANCE RIKO, Inc. Copyright © ADVANCE RIKO, Inc. All Rights Reserved.