Arc Plasma Source APS-1

Simultaneous deposition of different “targets”
By adding this source to APD series or your vacuum chamber, different “targets” can be deposited simultaneously and materials with new characters can be produced.

Applications

  • Produce chemical compounds from multiple depositions
  • Add to your vacuum chamber

Features

  • Due to size uniformity of nanoparticles compared with ones produced through previous wet process, highly active catalysts can be produced.
  • Capable of selecting nanoparticle diameter from approx.1.5nm to 6nm
  • Capable of generating easily oxide and nitride by changing atmosphere
  • Attachable to a vacuum flange of ICF070 (VG50) or equivalent without any consideration of which direction
  • Easy maintenance because no water cooling facilities are needed

Specifications

Target size φ 10 × L 17 (mm)
Substrate size φ 2 inch (φ 50 mm)
Deposition rate 0.01 ~ 0.3 nm/s *1
Film thickness uniformity Fe: < ± 10 % (φ 20mm area) *1
Materials Available for deposition Conductive materials *2

*1 Distance from a target to a substrate: 80mm
*2 Specific resistance of a target: 0.01Ωcm or less

Schematic of the Arc Plasma Source(APS)

Utility

System diagram

  • Power requirement:AC200V Single phase ±10% 2kVA
  • Dimension
  • ❶ Condenser box:W110 x D320 x H200 (mm)
  • ❷ Body of APS within vacuum chamber:φ34 x L200 (mm)
  • ❸ Power supply unit:W200 x D360 x H200 (mm)
  • ❹ Controller:W240 x D400 x H200 (mm)

*Put power supply unit & controller onto the rack.

TEM Images for Nano-Particles prepared by APS

  • TEM image of Pt nano-particles supported on
    Well-dispersed Pt nano-particles on the carbon powder are deposited.
  • TEM image of Pt nono-particles on a substrate
    The size of nano-particle becomes larger as the pulse number of arc plasma shots is increased.
  • TEM image of Pt thin film
    Extremely thin Pt film is formed by a stacking of nano-particles.

Photos of Deposition System installing APS

Example 1 : Sputtering system with APS
Example 2 : Arc Plasma Deposition system with one APS(APD-1P)

Table 1 Elements checked for deposition

1A 2A 3A 4A 5A 6A 7A 8 1B 2B 3B 4B 5B 6B 7B 0
1 H He
2 Li Be B C N O F Ne
3 Na Mg Al Si P S Cl Ar
4 K Ca Sc Ti V Cr Mn Fe Co Ni Cu Zn Ga Ge As Se Br Kr
5 Rb Sr Y Zr Nb Mo Tc Ru Rh Pd Ag Cd In Sn Sb Te I Xe
6 Cs Ba Lanthanoid Hf Ta W Re Os Ir Pt Au Hg TI Pb Bi Po At Rn
7 Fr Ra Actinoid

  Checked   Limited in use

Inquiries about this product

Related product

  1. Arc-Plasma method nano-particle Deposition System APD series