thin film coating・nano particle coating Analyzer list
Pulsed arc plasma discharge (APD method) enables the formation of metallic nanoparticles on substrates and powders in vaccum.
Effects not obtainable by other deposition methods can be expected like (dry) nano-order film thickness control, particle size control of nanoparticles, and alloying of nanoparticles by deposition of multiple elements (up to six elements possible).
Applications are numerous such as activities of various catalysts, metal coatings and the precision synthesis.
More than 30 different elements can be deposited from light metals such as Al to heavy metals such as lanthanoides.
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Arc-Plasma method nano-particle Deposition System APD seriesNew nanoparticle deposition system using pulse vacuum arc discharge Pulse vacuum arc deposition is a unique technique to deposit ultrathin films and nanoparticles by generating metal ions in a simple process. This system can achieve high in terms of film flatness and particle fineness, which is impossible with other systems.