Semiconductor Product list
It is possible to make precise temperature control in addition to clean and rapid heating and cooling with an infrared lamp heating furnace.
In addition, it is also possible to handle special gases in the chamber, such as inert gas, NH3 and hydrogen, and offer a lineup that matches a variety of needs, from small-piece sizes to large-diameters, and automatic heat treatment with robot transfer.
We can cover a series of processes from basic research to mass production and quality inspection.
Also, we can offer the suitable system for high-speed heating/cooling of diamond semiconductors for SiC・GaN and next-generation semiconductors, diffusion-annealing after ion-implantation, electrode-resistance reduction, and annealing for oxide/nitride formation.
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Heating a small piece of sample up to 1800°C just in 10 seconds. HT-RTA59HD is a desktop-type lamp annealing system which enables a small piece of sample to heat up to 1800°C (Ultrahigh temperature zone) just in 10 seconds with high reflection efficiency by spot focused heating.