Metal ions are created and then ultra thin films and nanoparticles are formed by pulse arc-deposition of the metal ions. The films’ flatness and particles’ finecess are satisfactory compared to those created by other methods.
Powder support model
| nano particle | powder material, size, quantity |
|---|---|
| 1～20nm conductive material(melting point 150℃ or more) semi-conductor |
powder material carbon, alumina, silica etc. size 10μm～approx. 1mm quantity 10〜20cc |
metal film
| deposition material | shape, thickness |
|---|---|
| conductive metal (melting point 150℃ or more) semi-conductor |
shape max. φ2 inch thickness 1〜20μm * Consult us about when sample’s thickness is μm. |
deposition of these elements observed
| 1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 | 12 | 13 | 14 | 15 |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Li | Be | B | C | N | ||||||||||
| Na | Mg | Al | Si | P | ||||||||||
| K | Ca | Sc | Ti | V | Cr | Mn | Fe | Co | Ni | Cu | Zn | Ga | Ge | As |
| Rb | Sr | Y | Zr | Nb | Mo | Tc | Ru | Rh | Pd | Ag | Cd | In | Sn | Sb |
| Cs | Ba | Hr | Ta | W | Re | Os | Ir | Pt | Au | Hg | Ti | Pb | Bi | |
| Fr | Ra | Rf | Db | Sg | Bh | Hs | Mt | Ds | Dy | |||||
record available record and stcok available use restricted
compounds (Its deposition was observed.)：WC, TiAl, SiC, inconel, TiN, alumina, AlN, TiO2, SiP2, HfOx, HfC, NdFeB
suitable for this measurement：Arc-Plasma method nano-particle Deposition System APD series
