The flat plate reflected infrared heating furnace can be used for applications such as a 2-inch to 300 mm diameter wafer lamp annealing system or a production baking furnace.
Applications
- The Ps type has 40-mm wide reflective surfaces.
- The Pss type has 20-mm wide reflective surfaces that allow high density lamp configurations.
- Both the Ps type and the Pss type can heat a wide area by increasing the number of reflective surfaces.
Features
- Heating large glass substrates (Solar cells, FPD, etc.).
- High-temperature, high-speed heating of semiconductor wafers.
- Annealing of thin steel sheets
Specifications
| Model*1 | Heating Method | Lamp Number | Heating Length (Light Emission length) |
Lamp Voltage | Input |
|---|---|---|---|---|---|
| Ps15V | Planar radiation heating | 1 | 140mm | 200V | 1.2kW |
| Ps110V | 265mm | 2.0kW | |||
| Ps116V | 420mm | 300V | 3.0kW | ||
| Ps35V | 3 | 140mm | 200V | 3.6kW | |
| Ps310V | 265mm | 6.0kW | |||
| Ps316V | 420mm | 300V | 9.0kW | ||
| Pss35V | 140mm | 200V | 3.6kW | ||
| Pss38V | 200mm | 4.8kW | |||
| Pss310V | 265mm | 6.0kW | |||
| Pss316V | 420mm | 300V | 9.0kW |
- For Ps(s)35V
- P : Parabolodial reflection , s : 40mm-width,(ss : 20mm-width) , 3 : Lamp number , 5 : Lamp length , V : Planar Heating type
・Please be aware that heating furnaces require cooling water.
・Heating temperature changes according to the heated sample’s infrared reflectance, absorption, heat capacity, and material.
・For other specification requirements, please feel free to contact us.
