MILA-5000 series
The MILA-5000 series can perform high speed heating, high speed cooling, and clean heating, which are characteristics of the Infrared Gold Image Furnace. It can heat materials under adjustable atmospheres and combines a temperature controller and variable atmosphere chamber into a single low-cost infrared lamp heating system. Heating operations can be run by a PC connected via USB and data can be easily managed.
MILA-5000UHV
Based on the MILA-5000-P-N (high temperature type), the MILA-5000UHV was born as a concept that supports a high vacuum and adds to MILA-5000 series features such as high speed heating and cooling, precise temperature control, clean heating, and flexible atmosphere selection. Heating operations can be run by a PC connected via USB and data can be easily managed.
Applications
MILA-5000 series
- Crystal annealing of ferroelectric thin films.
- Diffusion annealing, oxide film deposition annealing after ion implantation.
- Sintering, alloying treatment of Si and compound wafers.
- Glass substrate uniform temperature annealing.
- Thermal cycle, thermal shock, thermal fatigue testing.
- Temperature programmed desorption testing, catalytic effect testing.
MILA-5000UHV
- Heat treatment in a high vacuum.
- Temperature-programmed desorption gas analyzing furnace.
Features
MILA-5000 series
- 50°C/s high speed heating.
- Select the desired atmosphere from vacuum, gas, gas flow, air.
- Precise temperature control.
- Compact, table-top design.
- Simple input of temperature recipe into computer connected with USB
- Display temperature data on the PC monitor during heating
MILA-5000UHV
- Heat treatment in a high vacuum atmosphere.
- Pumping down up to 10-4 Pa (when using TMP).
- Inherits the capabilities of the MILA-5000-P-N (high temperature type).
- Compact, table-top design.
- Simple input of temperature recipe into computer connected with USB
- Display temperature data on the PC monitor during heating
Specifications
MILA-5000 series
| Model | MILA-5000-P-N (high temperature type) |
MILA-5000-P-F (uniform temperature type) |
|---|---|---|
| Temperature Range | RT ～ 1200 °C | RT ～ 800 °C |
| Sample Size | □ 20 × t 2 (mm) | |
| Atmosphere | Air, Low vacuum, Gas flow | |
| Process pressure | More than 10Pa ~ atmospheric pressure | |
*Vacuum pumping system is optional.
*Heating temperature changes according to the heated sample’s infrared reflectance, absorption, heat capacity, and material.
Uniform heating type
| Model | MILA-5000UHV |
|---|---|
| Temperature Range | RT ～ 1000 °C |
| Sample Size | □ 20 × t 2 (mm) |
| Atmosphere | Air, High vacuum, Inert gas |
| Process pressure | 10-4Pa ~ atmospheric pressure |
*Vacuum pumping system is optional.
*Heating temperature changes according to the heated sample’s infrared reflectance, absorption, heat capacity, and material.
Option
High temperature type
MILA5000-P-N Maxium heating rate
Sample : W20×L20×t0.5(㎜) nickel plate
Atmosphere : Vacuum
Rating : 200V 4kW, 100%output
MILA5000-P-N Temperature uniformity
Sample : W20×L20×t0.5(㎜) nickel plate
Atmosphere : Vacuum
T・C（K）measuring point
Uniform heating type
MILA5000-P-F Maxium heating rate
Sample : W20×L20×t0.5(㎜) nickel plate
Atmosphere : Vacuum
Rating : 200V 1kW, 100%output
MILA5000-P-F Temperature uniformity
Sample : W20×L20×t0.5(㎜) nickel plate
Atmosphere : N2 Gas flow
T・C（K）measuring point
