Mini Lamp Annealer MILA-5000 series

MILA-5000 series
The MILA-5000 series can perform high speed heating, high speed cooling, and clean heating, which are characteristics of the Infrared Gold Image Furnace. It can heat materials under adjustable atmospheres and combines a temperature controller and variable atmosphere chamber into a single low-cost infrared lamp heating system. Heating operations can be run by a PC connected via USB and data can be easily managed.

MILA-5000UHV
Based on the MILA-5000-P-N (high temperature type), the MILA-5000UHV was born as a concept that supports an ultra-high vacuum and adds to MILA-5000 series features such as high speed heating and cooling, precise temperature control, clean heating, and flexible atmosphere selection. Heating operations can be run by a PC connected via USB and data can be easily managed.

Applications

MILA-5000 series
  • Crystal annealing of ferroelectric thin films.
  • Diffusion annealing, oxide film deposition annealing after ion implantation.
  • Sintering, alloying treatment of Si and compound wafers.
  • Glass substrate uniform temperature annealing.
  • Thermal cycle, thermal shock, thermal fatigue testing.
  • Temperature programmed desorption testing, catalytic effect testing.
MILA-5000UHV
  • Heat treatment in an ultra-high vacuum.
  • Temperature-programmed desorption gas analyzing furnace.

Features

MILA-5000 series
  • 50°C/s high speed heating.
  • Select the desired atmosphere from vacuum, gas, gas flow, air.
  • Precise temperature control.
  • Compact, table-top design.
  • Simple input of temperature recipe into computer connected with USB
  • Display temperature data on the PC monitor during heating
MILA-5000UHV
  • Heat treatment in an ultra-high vacuum atmosphere.
  • Handles up to 10-5 Pa (when using TMP).
  • Inherits the capabilities of the MILA-5000-P-N (high temperature type).
  • Compact, table-top design.
  • Simple input of temperature recipe into computer connected with USB
  • Display temperature data on the PC monitor during heating

Specifications

MILA-5000 series
Model MILA-5000-P-N
(high temperature type)
MILA-5000-P-F
(uniform temperature type)
Temperature Range RT ~ 1200 °C RT ~ 800 °C
Sample Size □ 20 × t 2 (mm)
Atmosphere Air, Vacuum, Gas flow

*Vacuum pumping system is optional.
*Heating temperature changes according to the heated sample’s infrared reflectance, absorption, heat capacity, and material.

Uniform heating type
Model MILA-5000UHV
Temperature Range RT ~ 1200 °C
Sample Size □ 20 × t 2 (mm)
Atmosphere Air, Vacuum, Inert gas

*Vacuum pumping system is optional.
*Heating temperature changes according to the heated sample’s infrared reflectance, absorption, heat capacity, and material.

オプション例

High temperature type

MILA5000-P-N Temperature uniformity
Sample : W20×L20×t0.5(㎜) nickel plate
Atmosphere : Vacuum T・C(K)measuring point

MILA5000-P-N Maxium heating rate
Sample : W20×L20×t0.5(㎜) nickel plate
Atmosphere : Vacuum
Rating : 200V 4kW, 100%output

Uniform heating type

MILA5000-P-N Maxium heating rate
Sample : W20×L20×t0.5(㎜) nickel plate
Atmosphere : Vacuum
Rating : 200V 4kW, 100%output

MILA5000-P-N Temperature uniformity
Sample : W20×L20×t0.5(㎜) nickel plate
Atmosphere : Vacuum T・C(K)measuring point

高温型

MILA5000-P-N型最高昇温速度
サンプル :  W20×L20×t0.5(㎜) Ni板材
雰囲気 : 真空中
定格 : 200V4kW100%出力

MILA5000-P-N型温度分布
サンプル : W20×L20×t0.5(㎜) Ni板材
雰囲気 : 真空中
TC(K)測定点

均熱型

MILA5000-P-F型最高昇温速度
サンプル : W20×L20×t0.5(㎜) Ni板材
雰囲気 : 真空中
定格 : 200V1kW100%出力

MILA5000-P-F型温度分布
サンプル : W20×L20×t0.5(㎜) Ni板材
雰囲気 : N2ガスフロー中
TC(K)測定点

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