As the cooling method is air-cooling with a fan, the heating operations can be easily started with just a wall outlet.
Applications
- High-speed heating of wafers, compound wafers
- Photo CVD substrate heating
- Thermal cycle tests
- Heat resistance evaluations of coating films
- Heating and drying of organic materials and resins
Features
- 50 °C/s high-speed heating
- Selectable atmosphere: vacuum, gas, gas flow, air
- Precise temperature control
- Compact, table-top design
Specifications
| Temperature Range | RT ～ 700 °C |
|---|---|
| Sample Size | 20mm square x 2mm thickness |
| Measurement Atmosphere | Air, Vacuum, Gas flow |
