Mini Lamp Annealer with air-cooling system MILA-700AR

Applications

  • High-speed heating of wafers, compound wafers
  • Photo CVD substrate heating
  • Thermal cycle tests
  • Heat resistance evaluations of coating films
  • Heating and drying of organic materials and resins

Features

  • 50 °C/s high-speed heating
  • Selectable atmosphere: vacuum, gas, gas flow, air
  • Precise temperature control
  • Compact, table-top design

Specifications

Temperature Range RT ~ 700 °C
Sample Size 20mm square x 2mm thickness
Measurement Atmosphere Air, Vacuum, Gas flow
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