Infrared Gold Image Furnace
Ps, Pss series

Useable in wide fields from carbon nanotube growth equipment to production equipment.
The flat plate reflected infrared heating furnace can be used for applications such as a 2-inch to 300 mm diameter wafer lamp annealing system or a production baking furnace.

Applications

The Ps type has 40-mm wide reflective surfaces.
The Pss type has 20-mm wide reflective surfaces that allow high density lamp configurations.
Both the Ps type and the Pss type can heat a wide area by increasing the number of reflective surfaces.

Features

Heating large glass substrates (Solar cells, FPD, etc.).
High-temperature, high-speed heating of semiconductor wafers.
Annealing of thin steel sheets

Specifications

Model^*1	Heating Method	Lamp Number	Heating Length (Light Emission length)	Lamp Voltage	Input
Ps15V	Planar radiation heating	1	140mm	200V	1.2kW
Ps110V			265mm	200V	2.0kW
Ps116V			420mm	300V	3.0kW
Ps35V		3	140mm	200V	3.6kW
Ps310V			265mm	200V	6.0kW
Ps316V			420mm	300V	9.0kW
Pss35V			140mm	200V	3.6kW
Pss38V			200mm		4.8kW
Pss310V			265mm		6.0kW
Pss316V			420mm	300V	9.0kW

＊1　Model number meaning

For Ps(s)35V: P : Parabolodial reflection , s : 40mm-width,(ss : 20mm-width) , 3 : Lamp number , 5 : Lamp length , V : Planar Heating type

・Please be aware that heating furnaces require cooling water.
・Heating temperature changes according to the heated sample’s infrared reflectance, absorption, heat capacity, and material.
・For other specification requirements, please feel free to contact us.