Low Cost Infrared Lamp Heating System for R&D
RTP-6

80°C/s high speed annealing possible at low cost.
This infrared lamp heating system with parabolic type reflectors can heat uniformly a wafer of the size up to 6 inches. It is capable of high-speed heat treatment, the most available for the research and development of heat treatment process. Silicide formation in individual semiconductor process and process annealing of compound semiconductor are available.

Features

Capable of high speed heat treatment.
Capable of high speed cooling with the metal chamber cold-wall Cconstruction.
Gas flow after vacuum displacement is also available.
Temperature program setting and external signal input is easily executed from a PC.
Temperature data during heating can also be displayed on a PC.
A quartz protection plate (optional) can be installed in the chamber to prevent contamination.
Equipped with various safety measures.
Capable of excellent temperature distribution and reproducibility with the 9 zone control.

Specifications

Temperature Range	RT ～ 1100 °C
Sample Size	6-inch wafer 1 piece (4 or 5-inch wafer is optional.)
Atmosphere	In Static gas, Gas flow, Air, Vacuum (Vacuum pumping system is optional.)
Heating Method	Top single-side heating method by paraboloidal surface reflected infrared lamp
Maximum Heating Rate	80 °C/s
Uniform Temp. Precision	ΔT = 10 °C at 800 °C being maintained in N₂
Control Sensor	Thermocouple JIS "K" (inserted in SiC coated carbon susceptor), pyrometer (option)

Constitution

Infrared gold image furnace
Heat treatment chamber
Programmable temperature controller
9-zone output unit
Span change unit
Gas piping system
Hot air exhaust system
Frame・Switch board
Pyrometer (option)
Cooling water circulation system (option)
Vacuum exhaust system (option)

System diagram

Utility

Outside dimensions	Approx. W600　x D1000 x H1700 (mm) (excluding protrusion)
Weight	Approx. 300kg
Power requirements・grounding	Three phase AC 200V 30kVA, D type
Cooling water	City water 15L/min or more, 0.3MPa or more
Vacuuming port	KF-25
Gas port	IN: 1/4 Swagelok joint (or its equivalent) OUT:3/8 Swagelok joint (or its equivalent)
Hot air outlet	Approx. φ50 short tube

Analysis service by using this product

heat treatment analysis

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Low Cost Infrared Lamp Heating System for R&D RTP-6