Thermal Diffusivity measurement system by Xe flash method TD-1

Capable of evaluation of heat radiation film in the thickness direction and anisotropy
The most suitable system for the evaluations of heat dissipation films etc. By using Xenon lamp, it enables to minimize the damage to the sample. Sample anisotropy can also easily measure by using the original attachment as an option.

Applications

Research and development of thermoelectric materials
Research and development of ceramics, metals and organic materials
Evaluation of thermal diffusivity and thermal conductivity of materials related to FPD
Research of thermal diffusivity of materials such as semiconductor devices and molded(Seal) materials

Features

Specific heat measurement with contact and non-contact methods
Realize an uniform laser pattern (Patented)
Stabilized lower output laser power supply system(Patented)
Much better temperature controllability, stability with infrared gold image furnace (TC-1200RH model)
Available to measure thermal diffusivity at plane direction of thin film with a substrate measurement attachment

Specifications

Model	TD-1 HTV	TD-1 RTV	TD-1 RTA
Temperature range	RT ～ 350 °C (max.)	RT
Temperature Range	RT to Max. 350 °C	RT
Temperature Range	RT to Max. 350 °C	RT
Sample Size	φ10mm (Round samples, normal direction measurements) Sample thickness 25μm ～ 2mm (For polymid-based samples) ＜Option＞ Round sample holder (Normal direction) φ12.7, φ15, φ20 mm Square sample holder (Normal direction) □10, 12.7 mm In-plane direction holder (In-plane direction) φ 20 mm
Number of sample per a measurement	4 pieces		1 pieces
Atmosphere	Air, Vacuum, Inert gas		Air