Ceramics Product list
We offer the products that enables thermal evaluation accoding to each process from the acquisition of basic physical properties to quality inspection such as thermal shock test, thermal cycle test, heating observation test, thermal conductivity measurement, thermal expansion measurement, electrical resistance measurement, insulation resistance measurement etc for various ceramics (oxides, carbides, nitrides, etc.) materials, glass materials, and composite hybrid materials. Recently, the high-precision expansion measurement of laser interferometry type for the needs of zero-expansion materials has become increasingly necessary on the quality evaluation of products.
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Low Cost Infrared Lamp Heating System for R&D RTP-680°C/s high speed annealing possible at low cost. This infrared lamp heating system with parabolic type reflectors can heat uniformly a wafer of the size up to 6 inches. It is capable of high-speed heat treatment, the most available for the research and development of heat treatment process. Silicide formation in individual semiconductor process and process annealing of compound semiconductor are available.
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Mini Lamp Annealer MILA-5000 seriesMILA-5000 series The MILA-5000 series can perform high speed heating, high speed cooling, and clean heating, which are characteristics of the Infrared Gold Image Furnace. It can heat materials under adjustable atmospheres and combines a temperature controller and variable atmosphere chamber into a single low-cost infrared lamp heating system. Heating operations can be run by a PC connected via USB and data can be easily managed. MILA-5000UHV Based on the MILA-5000-P-N (high temperature type), the MILA-5000UHV was born as a……
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Mini Lamp Annealer with air-cooling system MILA-700ARini Lamp Annealer with no use of cooling water As the cooling method is air-cooling with a fan, the heating operations can be easily started with just a wall outlet.
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Simplified Infrared Lamp Heating System SSA seriesSimplified system with Infrared Gold Image Furnace and a quartz chamber. A low-cost heating system consist of an Infrared Golc Image Furnace and quartz chamber including a sample holder.
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Infrared Lamp Heating System QHC series/Variable Atmosphere Lamp Heating System VHC seriesHelping process development From solar cells to compound semiconductors. Combining an Infrared Gold Image Furnace and temperature controller, the QHC/VHC series is a compact high speed heating/ cooling system equipped with a quartz heat treatment chamber. The system is customizable to your needs.
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Spot Focused Infrared Gold Image Furnace System seriesHeating up to 1800°C in just 1 min. For ultra-high temperature vacuum heat treatment MIRO series is a compact spot focused Gold Image Furnace which enables to heat up to 1800°C with extremely high reflection efficiency in combination with single or double type chambers.
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Rapid Heating / Water Quenching System CAS-59AQRapid heating and quenching of materials This system is capable of water quench after heating. The maximum temperature is 1800°C under various atmospheres.
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High Temperature Rapid Thermal Annealing System HT-RTA59HDHeating a small piece of sample up to 1800°C just in 10 seconds. HT-RTA59HD is a desktop-type lamp annealing system which enables a small piece of sample to heat up to 1800°C (Ultrahigh temperature zone) just in 10 seconds with high reflection efficiency by spot focused heating.
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Arc Plasma Source APS-1Simultaneous deposition of different “targets” By adding this source to APD series or your vacuum chamber, different “targets” can be deposited simultaneously and materials with new characters can be produced.
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Arc-Plasma method nano-particle Deposition System APD seriesNew nanoparticle deposition system using pulse vacuum arc discharge Pulse vacuum arc deposition is a unique technique to deposit ultrathin films and nanoparticles by generating metal ions in a simple process. This system can achieve high in terms of film flatness and particle fineness, which is impossible with other systems.