Arc Plasma Source APS-1

Simultaneous deposition of different “targets”
By adding this source to APD series or your vacuum chamber, different “targets” can be deposited simultaneously and materials with new characters can be produced.


  • Produce chemical compounds from multiple depositions
  • Add to your vacuum chamber


  • Due to size uniformity of nanoparticles compared with ones produced through previous wet process, highly active catalysts can be produced.
  • Capable of selecting nanoparticle diameter from approx.1.5nm to 6nm
  • Capable of generating easily oxide and nitride by changing atmosphere
  • Attachable to a vacuum flange of ICF070 (VG50) or equivalent without any consideration of which direction
  • Easy maintenance because no water cooling facilities are needed


Target size φ 10 × L 17 (mm)
Substrate size φ 2 inch (φ 50 mm)
Deposition rate 0.01 ~ 0.3 nm/s *1
Film thickness uniformity Fe: < ± 10 % (φ 20mm area) *1
Materials Available for deposition Conductive materials *2

*1 Distance from a target to a substrate: 80mm
*2 Specific resistance of a target: 0.01Ωcm or less

Schematic of the Arc Plasma Source(APS)


System diagram

  • Power requirement:AC200V Single phase ±10% 2kVA
  • Dimension
  • ❶ Condenser box:W110 x D320 x H200 (mm)
  • ❷ Body of APS within vacuum chamber:φ34 x L200 (mm)
  • ❸ Power supply unit:W200 x D360 x H200 (mm)
  • ❹ Controller:W240 x D400 x H200 (mm)

*Put power supply unit & controller onto the rack.

TEM Images for Nano-Particles prepared by APS

  • TEM image of Pt nano-particles supported on
    Well-dispersed Pt nano-particles on the carbon powder are deposited.
  • TEM image of Pt nono-particles on a substrate
    The size of nano-particle becomes larger as the pulse number of arc plasma shots is increased.
  • TEM image of Pt thin film
    Extremely thin Pt film is formed by a stacking of nano-particles.

Photos of Deposition System installing APS

Example 1 : Sputtering system with APS
Example 2 : Arc Plasma Deposition system with one APS(APD-1P)

Table 1 Elements checked for deposition

1A 2A 3A 4A 5A 6A 7A 8 1B 2B 3B 4B 5B 6B 7B 0
1 H He
2 Li Be B C N O F Ne
3 Na Mg Al Si P S Cl Ar
4 K Ca Sc Ti V Cr Mn Fe Co Ni Cu Zn Ga Ge As Se Br Kr
5 Rb Sr Y Zr Nb Mo Tc Ru Rh Pd Ag Cd In Sn Sb Te I Xe
6 Cs Ba Lanthanoid Hf Ta W Re Os Ir Pt Au Hg TI Pb Bi Po At Rn
7 Fr Ra Actinoid

  Checked   Limited in use

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Related product

  1. Arc-Plasma method nano-particle Deposition System APD series