Rapid heating Product list
Rapid heating can be achieved by radiation heating with the light of infrared lamps, and heating at a maximum temperature of 1800°C can be achieved by focusing the infrared light by gold reflective surface.
Precise temperature followability and temperature control by adjusting the output of lamps, and heating in vacuum, inert gas, ammonia and hydrogen, and ozone gas are possible.
It can contribute to process simulation in small sample and to tact time reduction in material research and production process. It also contributes to carbon neutrality from the viewpoint of energy loss.
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Infrared lamp heating system RTP-mini
This system is a compact desktop type of RTP-6 for conventional infrared-heating system. We have achieved quiet heating with efficient cooling and reduced noise with eliminating the conventional heat exhaust unit and adopting a cooling fan.
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Meeting customer needs with infrared lamp heating Infrared Gold Image Furnaces can be used in many fields for research and development or as production equipment. We’re meeting the needs of our customers from high speed heating to wide area heating.
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Useable in wide fields from carbon nanotube growth equipment to production equipment. The flat plate reflected infrared heating furnace can be used for applications such as a 2-inch to 300 mm diameter wafer lamp annealing system or a production baking furnace.
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Temperature controller capable of supporting high-speed heating with good precision. This programmable temperature controller can support not only Infrared Gold Image Furnaces that require a fast response during high-speed heating , but also low-speed heating furnaces. It features high functionality and high performance in a compact package and meets your needs with a low price and many accessories.
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High speed heat treatment from 2 inches to 300 mm 10 seconds until retention. Infrared lamp heating is the method which can take advantage of its features of High energy density, Near infrared rays, High heat responsiveness, Temperature controllability, and Cold wall method. We’re meeting the needs of our customers with supplying RTA Series, which can control the process recipe (heating and cooling) and gas type with its flow amount. The system is suitable for finding the best heating conditions.
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80°C/s high speed annealing possible at low cost. This infrared lamp heating system with parabolic type reflectors can heat uniformly a wafer of the size up to 6 inches. It is capable of high-speed heat treatment, the most available for the research and development of heat treatment process. Silicide formation in individual semiconductor process and process annealing of compound semiconductor are available.
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MILA-5000 series The MILA-5000 series can perform high speed heating, high speed cooling, and clean heating, which are characteristics of the Infrared Gold Image Furnace. It can heat materials under adjustable atmospheres and combines a temperature controller and variable atmosphere chamber into a single low-cost infrared lamp heating system. Heating operations can be run by a PC connected via USB and data can be easily managed. MILA-5000UHV Based on the MILA-5000-P-N (high temperature type), the MILA-5000UHV was born as a……
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ini Lamp Annealer with no use of cooling water As the cooling method is air-cooling with a fan, the heating operations can be easily started with just a wall outlet.
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Simplified system with Infrared Gold Image Furnace and a quartz chamber. A low-cost heating system consist of an Infrared Golc Image Furnace and quartz chamber including a sample holder.
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Helping process development From solar cells to compound semiconductors. Combining an Infrared Gold Image Furnace and temperature controller, the QHC/VHC series is a compact high speed heating/ cooling system equipped with a quartz heat treatment chamber. The system is customizable to your needs.