Nanoparticles forming apparatus

Arc Plasma Source APS-1

Simultaneous deposition of different “targets”
By adding this source to APD series or your vacuum chamber, different “targets” can be deposited simultaneously and materials with new characters can be produced.

Applications

Produce chemical compounds from multiple depositions
Add to your vacuum chamber

Features

Due to size uniformity of nanoparticles compared with ones produced through previous wet process, highly active catalysts can be produced.
Capable of selecting nanoparticle diameter from approx.1.5nm to 6nm
Capable of generating easily oxide and nitride by changing atmosphere
Attachable to a vacuum flange of ICF070 (VG50) or equivalent without any consideration of which direction
Easy maintenance because no water cooling facilities are needed

Specifications

Target size	φ 10 × L 17 (mm)
Substrate size	φ 2 inch (φ 50 mm)
Deposition rate	0.01 ～ 0.3 nm/s ^*1
Film thickness uniformity	Fe: < ± 10 % (φ 20mm area) ^*1
Materials Available for deposition	Conductive materials ^*2

*1 Distance from a target to a substrate: 80mm
*2 Specific resistance of a target: 0.01Ωcm or less

Schematic of the Arc Plasma Source(APS)

Utility

System diagram

Power requirement：AC200V Single phase ±10% 2kVA
Dimension
❶ Condenser box：W110 x D320 x H200 (mm)
❷ Body of APS within vacuum chamber：φ34 x L200 (mm)
❸ Power supply unit：W200 x D360 x H200 (mm)
❹ Controller：W240 x D400 x H200 (mm)

＊Put power supply unit & controller onto the rack.

TEM Images for Nano-Particles prepared by APS

TEM image of Pt nano-particles supported on
Well-dispersed Pt nano-particles on the carbon powder are deposited.
TEM image of Pt nono-particles on a substrate
The size of nano-particle becomes larger as the pulse number of arc plasma shots is increased.
TEM image of Pt thin film
Extremely thin Pt film is formed by a stacking of nano-particles.