Thermal Expansion Measurment System
by Laser Interferometer
LIX-2 series

High-accuracy measurement of thermal expansion with a minimum resolution of 1nm
This is a laser thermal expansion measurement system with ultra-high sensitivity developed by the use of the latest optical techniques. This system is suitable to be used as a calibration system for a standard thermal dilatometer, also to measure absolute thermal expansion measurements of unknown samples. This system is compliant with JIS R3251-1995, Measuring method of the linear thermal expansion coefficient for low expansion glass by laser interferometry.

Applications

Measurement of organic films in the thickness direction
Precise measurement of low expansion glass
Quality control measurement of low expansion metal materials
Measurement of seal materials
Precise measurement of parts of electronic devices
Measurement of calibration samples for a standard thermal dilatometer

Features

Stable measurement is available with a parallel-shifting sample holder.
High-accuracy measurement with reading resolution of 1nm
With the use of a quartz sample, films or thin plates with thickness of 50 ～ 500μm can be measurable in the thickness direction.

Specifications

Model	LIX-2M	LIX-2L
Temperature range	RT ～ 700 °C	-150 ～ 200 °C
Sample size	φ5 ～ 6 × L10 ～ 15 (mm) Both sides in the length direction are finished spherically.
Atmosphere	➀Vacuum　➁Low pressure high purity helium gas
Measurement method	Dual path Michelson laser interferometry

A patent and a standard

Complies with JISR 3251-1995 Parallel moving sample holder (patented)

Analysis service by using this product

thermal expansion analysis