Catalyst Product list
For various catalytic materials such as fuel cell catalysts, photocatalysts, and exhaust gas catalysts, we support your research on new functional catalysts such as impurity removal, powder synthesis, and homogenization by infrared lamp heating and nano-particle formation and exploration, alloying of nano-particles with plural elements, and high activation test by arc plasma system (APD method),
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Infrared Gold Image Furnace RHL-E/VHT/P seriesMeeting customer needs with infrared lamp heating Infrared Gold Image Furnaces can be used in many fields for research and development or as production equipment. We’re meeting the needs of our customers from high speed heating to wide area heating.
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Infrared Gold Image Furnace Ps, Pss seriesUseable in wide fields from carbon nanotube growth equipment to production equipment. The flat plate reflected infrared heating furnace can be used for applications such as a 2-inch to 300 mm diameter wafer lamp annealing system or a production baking furnace.
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Programmable Temperature Controller TPC-5000 seriesTemperature controller capable of supporting high-speed heating with good precision. This programmable temperature controller can support not only Infrared Gold Image Furnaces that require a fast response during high-speed heating , but also low-speed heating furnaces. It features high functionality and high performance in a compact package and meets your needs with a low price and many accessories.
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Rapid Thermal Annealing System RTA seriesHigh speed heat treatment from 2 inches to 300 mm 10 seconds until retention. Infrared lamp heating is the method which can take advantage of its features of High energy density, Near infrared rays, High heat responsiveness, Temperature controllability, and Cold wall method. We’re meeting the needs of our customers with supplying RTA Series, which can control the process recipe (heating and cooling) and gas type with its flow amount. The system is suitable for finding the best heating conditions.
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Low Cost Infrared Lamp Heating System for R&D RTP-680°C/s high speed annealing possible at low cost. This infrared lamp heating system with parabolic type reflectors can heat uniformly a wafer of the size up to 6 inches. It is capable of high-speed heat treatment, the most available for the research and development of heat treatment process. Silicide formation in individual semiconductor process and process annealing of compound semiconductor are available.
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Mini Lamp Annealer MILA-5000 seriesMILA-5000 series The MILA-5000 series can perform high speed heating, high speed cooling, and clean heating, which are characteristics of the Infrared Gold Image Furnace. It can heat materials under adjustable atmospheres and combines a temperature controller and variable atmosphere chamber into a single low-cost infrared lamp heating system. Heating operations can be run by a PC connected via USB and data can be easily managed. MILA-5000UHV Based on the MILA-5000-P-N (high temperature type), the MILA-5000UHV was born as a……
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Mini Lamp Annealer with air-cooling system MILA-700ARini Lamp Annealer with no use of cooling water As the cooling method is air-cooling with a fan, the heating operations can be easily started with just a wall outlet.
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Simplified Infrared Lamp Heating System SSA seriesSimplified system with Infrared Gold Image Furnace and a quartz chamber. A low-cost heating system consist of an Infrared Golc Image Furnace and quartz chamber including a sample holder.
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Infrared Lamp Heating System QHC series/Variable Atmosphere Lamp Heating System VHC seriesHelping process development From solar cells to compound semiconductors. Combining an Infrared Gold Image Furnace and temperature controller, the QHC/VHC series is a compact high speed heating/ cooling system equipped with a quartz heat treatment chamber. The system is customizable to your needs.
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Spot Focused Infrared Gold Image Furnace System seriesHeating up to 1800°C in just 1 min. For ultra-high temperature vacuum heat treatment MIRO series is a compact spot focused Gold Image Furnace which enables to heat up to 1800°C with extremely high reflection efficiency in combination with single or double type chambers.