Semiconductor Product list
It is possible to make precise temperature control in addition to clean and rapid heating and cooling with an infrared lamp heating furnace.
In addition, it is also possible to handle special gases in the chamber, such as inert gas, NH3 and hydrogen, and offer a lineup that matches a variety of needs, from small-piece sizes to large-diameters, and automatic heat treatment with robot transfer.
We can cover a series of processes from basic research to mass production and quality inspection.
Also, we can offer the suitable system for high-speed heating/cooling of diamond semiconductors for SiC・GaN and next-generation semiconductors, diffusion-annealing after ion-implantation, electrode-resistance reduction, and annealing for oxide/nitride formation.
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Infrared lamp heating system RTP-miniThis system is a compact desktop type of RTP-6 for conventional infrared-heating system. We have achieved quiet heating with efficient cooling and reduced noise with eliminating the conventional heat exhaust unit and adopting a cooling fan.
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Scanning Thermal Probe Micro-image STPM-10002 dimensional distribution of Seebeck coefficient and thermal conductivity measurement system by thermal probe STPM-1000 is used for evaluating Seebeck coefficient and thermal conductivity simultaneously. Simple evaluation of thermoelectric materials is possible by simultaneous evaluations of seebeck coefficient and thermal conductivity. The thermal conductivity distribution evaluation of functionally graded materials, multilayer substrates and organic materials is also possible. STPM-1000 is expected to use materials evaluation as a basic tool.
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Electric Resistance Measurement System for Metals and Semiconductors TER seriesMetallic phase transition, aging, recrystallization reaction This system can measure precisely the electric resistance of metallic alloys and semiconductors with DC four-thermal method.
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Rapid Thermal Annealing System RTA seriesHigh speed heat treatment from 2 inches to 300 mm 10 seconds until retention. Infrared lamp heating is the method which can take advantage of its features of High energy density, Near infrared rays, High heat responsiveness, Temperature controllability, and Cold wall method. We’re meeting the needs of our customers with supplying RTA Series, which can control the process recipe (heating and cooling) and gas type with its flow amount. The system is suitable for finding the best heating conditions.
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Low Cost Infrared Lamp Heating System for R&D RTP-680°C/s high speed annealing possible at low cost. This infrared lamp heating system with parabolic type reflectors can heat uniformly a wafer of the size up to 6 inches. It is capable of high-speed heat treatment, the most available for the research and development of heat treatment process. Silicide formation in individual semiconductor process and process annealing of compound semiconductor are available.
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Mini Lamp Annealer MILA-5000 seriesMILA-5000 series The MILA-5000 series can perform high speed heating, high speed cooling, and clean heating, which are characteristics of the Infrared Gold Image Furnace. It can heat materials under adjustable atmospheres and combines a temperature controller and variable atmosphere chamber into a single low-cost infrared lamp heating system. Heating operations can be run by a PC connected via USB and data can be easily managed. MILA-5000UHV Based on the MILA-5000-P-N (high temperature type), the MILA-5000UHV was born as a……
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Mini Lamp Annealer with air-cooling system MILA-700ARini Lamp Annealer with no use of cooling water As the cooling method is air-cooling with a fan, the heating operations can be easily started with just a wall outlet.
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Simplified Infrared Lamp Heating System SSA seriesSimplified system with Infrared Gold Image Furnace and a quartz chamber. A low-cost heating system consist of an Infrared Golc Image Furnace and quartz chamber including a sample holder.
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Infrared Lamp Heating System QHC series/Variable Atmosphere Lamp Heating System VHC seriesHelping process development From solar cells to compound semiconductors. Combining an Infrared Gold Image Furnace and temperature controller, the QHC/VHC series is a compact high speed heating/ cooling system equipped with a quartz heat treatment chamber. The system is customizable to your needs.
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Spot Focused Infrared Gold Image Furnace System seriesHeating up to 1800°C in just 1 min. For ultra-high temperature vacuum heat treatment MIRO series is a compact spot focused Gold Image Furnace which enables to heat up to 1800°C with extremely high reflection efficiency in combination with single or double type chambers.