Magnetic material Product list
For magnetic materials of powder materials and bulk materials, we follow with calcination, grinding, granulation, high-temperature sintering after compression molding, electrical resistance, thermal conductivity, thermal expansion and Curie point measurement for thermal property evaluation, etc.
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Thermal conductivity evaluation for a nano thin film at normal direction TCN-2ω is the world’s only system which can measure thermal conductivity for a nano thin film at normal direction.
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Thermal conductivity evaluation in-plane direction of films, thin sheets and thin films etc. This system can measure thermal diffusivity of sheet materials in-plane direction by scanning laser heating AC method (Angstrom method). About high thermal conducting films, sub-micron thin films can also be measurable.
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Electric Resistance Measurement System for Metals and Semiconductors TER series
Metallic phase transition, aging, recrystallization reaction This system can measure precisely the electric resistance of metallic alloys and semiconductors with DC four-thermal method.
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Meeting customer needs with infrared lamp heating Infrared Gold Image Furnaces can be used in many fields for research and development or as production equipment. We’re meeting the needs of our customers from high speed heating to wide area heating.
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Useable in wide fields from carbon nanotube growth equipment to production equipment. The flat plate reflected infrared heating furnace can be used for applications such as a 2-inch to 300 mm diameter wafer lamp annealing system or a production baking furnace.
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Temperature controller capable of supporting high-speed heating with good precision. This programmable temperature controller can support not only Infrared Gold Image Furnaces that require a fast response during high-speed heating , but also low-speed heating furnaces. It features high functionality and high performance in a compact package and meets your needs with a low price and many accessories.
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High speed heat treatment from 2 inches to 300 mm 10 seconds until retention. Infrared lamp heating is the method which can take advantage of its features of High energy density, Near infrared rays, High heat responsiveness, Temperature controllability, and Cold wall method. We’re meeting the needs of our customers with supplying RTA Series, which can control the process recipe (heating and cooling) and gas type with its flow amount. The system is suitable for finding the best heating conditions.
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80°C/s high speed annealing possible at low cost. This infrared lamp heating system with parabolic type reflectors can heat uniformly a wafer of the size up to 6 inches. It is capable of high-speed heat treatment, the most available for the research and development of heat treatment process. Silicide formation in individual semiconductor process and process annealing of compound semiconductor are available.
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MILA-5000 series The MILA-5000 series can perform high speed heating, high speed cooling, and clean heating, which are characteristics of the Infrared Gold Image Furnace. It can heat materials under adjustable atmospheres and combines a temperature controller and variable atmosphere chamber into a single low-cost infrared lamp heating system. Heating operations can be run by a PC connected via USB and data can be easily managed. MILA-5000UHV Based on the MILA-5000-P-N (high temperature type), the MILA-5000UHV was born as a……
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ini Lamp Annealer with no use of cooling water As the cooling method is air-cooling with a fan, the heating operations can be easily started with just a wall outlet.